Terefilm Photopolymer
Terefilm Photopolymer is an advanced materials solution designed to address key challenges in semiconductor manufacturing, such as precision mass transfer and high-resolution photolithography. Its unique properties include precise patternability, minimal activation energy, and clean decomposition, making it ideal for applications requiring stringent cleanliness and high throughput. Notably, Terefilm achieves thermal stability at temperatures up to approximately 180°C before UV exposure. Upon low-energy UV irradiation, the decomposition temperature is significantly lowered, facilitating easy integration into manufacturing processes with higher temperature demands.
One of Terefilm's key advantages is its efficient vaporization process, which occurs at around 60°C, requiring minimal energy activation. This low power requirement extends the lifespan of optical components and reduces costs associated with production tools, resulting in a lower cost of ownership compared to traditional systems that necessitate material ablation. Terefilm's clean decomposition process eliminates carbon residue, negating the need for energy-intensive cleaning procedures, thus enhancing component performance and cleanliness.
The photopolymer's precision patterning capabilities set it apart from competing solutions. It allows for precise spatial control, essential in laser transfers and component placement. Its low-energy requirement facilitates photomasking, thereby enabling selective die releases and pitch conversion, delivering massive throughput benefits. Engineered for Laser Induced Forward Transfer (LIFT), Terefilm is tailored for transferring small, thin, and fragile components, assuring uniform activation and vaporization over targeted areas, ensuring reliability and reproducibility in high-resolution patterning and precise component placement.
