Terefilm is a photopolymer specifically designed for the semiconductor industry, addressing challenges like precision mass transfer and high-resolution photolithography. Its properties facilitate precise patterning and clean decomposition, making it ideal for applications requiring stringent cleanliness and control. This innovation is notable for its low activation energy, enabling semiconductor applications with reduced power usage and enhanced efficiency.
The photopolymer achieves thermal stability up to approximately 180°C prior to ultraviolet exposure, allowing integration into elevated temperature manufacturing processes. Upon exposure to UV light, the decomposition temperature lowers significantly, reducing energy requirements for vaporization. This decomposition is enhanced by acid catalysis, resulting in immediate vaporization into gaseous products without leaving residue.
Terefilm's low energy activation opens new possibilities for selective component release, beneficial for MicroLED mass transfer. By lowering manufacturing costs and extending the lifespan of production tools, Terefilm delivers an economically advantageous solution. Its clean decomposition eliminates the need for post-processing cleaning steps, maintaining device performance.
The photopolymer's precise patterning capabilities ensure controlled spatial and temporal settings, allowing for reliable component placement. Designed for Laser Induced Forward Transfer (LIFT), it provides a pathway for high-resolution patterning and gentle wafer bonding release. This technology ensures uniform decomposition, enabling precision in various semiconductor applications.
