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All IPs > Memory Controller & PHY > NAND Flash > LEE Flash G2

LEE Flash G2

From Floadia Corporation

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Description

The LEE Flash G2 builds upon its predecessor, offering a Flash solution that harmoniously combines with logic circuits while minimizing costs and power consumption. It's based on a simple SONOS memory cell structure, allowing seamless integration with standard logic, thus converting volatile SRAM circuits into non-volatile versions.

This innovation removes the need for isolation areas and additional high voltage requirements during read operations, enhancing layout flexibility and power efficiency. Capable of supporting large memory capacities up to a few Megabytes, LEE Flash G2 stands out for its compatibility with existing CMOS processes and its ability to maintain performance without altering design characteristics.

The G2 utilizes a very low power Fowler-Nordheim tunneling mechanism, ensuring minimal current consumption during programming and erasing, which leads to significantly reduced testing time and expenses. Its architecture is particularly advantageous in automotive applications requiring high-temperature operations and long data retention periods.

Features
  • Direct logic circuit connection
  • No high voltage for Read operation
  • High temperature and retention support
Foundries & Process Nodes
Foundry Process Nodes
Intel Foundry Intel 4
Intel 20A
Tech Specs
Class Value
Categories Memory Controller & PHY > NAND Flash
Memory & Logic Library > Embedded Memories
Memory Controller & PHY > Flash Controller
Memory Controller & PHY > SDRAM Controller
Memory Controller & PHY > SRAM Controller
Process platform 55BCD
Memory Size 128K-Byte (1M-bit)
P/E Cycles 100K
Operation Temperature(Tj) -10~175°C
Data Retention 10 years @175°C post PE 10K
Additional Masks 4
Supply Voltage 1.2V ±10% to 2.5V-5.5V
Availability All Countries & Regions
Applications
  • Automotive
  • Consumer Electronics
  • Industrial
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