This versatile IO cell combines advancements in LVDS technology with CMOS GPIO functionality, tailored for seamless data communication across high-speed networks. Available in TSMC's various processes including 40nm and 65nm, it caters to different performance requirements.
The IO cell features integration of LVDS capabilities with CMOS GPIO, allowing dual-functionality in compact designs, optimizing board space and component efficiency. It's particularly suited for devices requiring simultaneous data transmission and digital interfacing.
Such technology is essential in networking and data-intensive environments, where reducing latency and ensuring reliable data flow are critical. The silicon-proven status across multiple process nodes makes it ideal for diverse implementations in modern complex systems.
